Influence of low energy ion bombardment on the properties of TiN films deposited by r.f. magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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1. Damage enhancement in BF2+ion-implanted silicon
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1. Ion-Exchange Transformation for the Targeted Synthesis of Solid Solutions of Metal Chalcogenides;Russian Journal of Physical Chemistry A;2020-12
2. Effect of low RF bias potential on AlN films obtained by Microwave Plasma Enhanced Chemical Vapor Deposition;Surface and Coatings Technology;2014-10
3. Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films;Thin Solid Films;2011-04
4. The influence of electric field on the microstructure of nc-Si:H films produced by RF magnetron sputtering;Vacuum;2008-08
5. Deposition of AlN films by reactive sputtering: Effect of radiofrequency substrate bias;Thin Solid Films;2007-06
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