Reactively sputtered indium oxide diffusion barrier-Reference-Cited by-同舟云学术

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Reactively sputtered indium oxide diffusion barrier

Published:1988-12 Issue: Volume:166 Page:15-20
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kolawa E.,Nieh C.W.,Molarius J.M.,Tran L.,Garland C.,Flick W.,Nicolet M.-A.,So F.C.T.,Wei J.C.S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Diffusion barriers in thin films

2. Diffusion barriers in layered contact structures

3. Barrier layers: Principles and applications in microelectronics

4. Reactively sputtered RuO2diffusion barriers

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tin doped indium oxide thin films: Electrical properties;Journal of Applied Physics;1998-03

2. Thermodynamic stability of binary oxides in contact with silicon;Journal of Materials Research;1996-11

3. Characterization of the oxidized indium thin films with thermal oxidation;Thin Solid Films;1996-06

4. ZrAl3Intermetallic Compound Thin Film as a Diffusion Barrier between Al and Au Layers;Japanese Journal of Applied Physics;1994-06-15

5. Microstructure of a sputtered Ti film on an indium tin oxide substrate;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-09

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