Low electric field Poole-Frenkel effect in r.f.-sputtered SiO2 films

Author:

Meaudre M.,Meaudre R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Transport mechanism in mica and SiO2 dielectrics;physica status solidi (b);2005-06

2. High-thermal-resistant dielectric coating deposited by plasma polymerization;Materials Science and Engineering: A;1991-07

3. Nucleation, growth and characterization of thin solid films;Progress in Crystal Growth and Characterization;1987-01

4. Electrical transport in RF-sputtered SiO2 films A review;Journal of Non-Crystalline Solids;1984-11

5. DC current transport in rf sputtered SiO2 films in the temperature range 77–357 K;Journal of Non-Crystalline Solids;1981-10

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