On-site tetrafluoroethylene gas generation from moderate-pressure pure tetrafluoromethane plasma reactor-Reference-Cited by-同舟云学术

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On-site tetrafluoroethylene gas generation from moderate-pressure pure tetrafluoromethane plasma reactor

Published:2021-01 Issue: Volume:229 Page:116125
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Ohmi Hiromasa^ORCID,Kikura Jou,Tanaka Tomoyuki,Tanaka Rei,Iino Daiki,Sakai Itsuko,Kurihara Kazuaki,Fukumizu Hiroyuki,Abe Junko,Fukuhara Jota,Hayashi Hisataka,Kakiuchi Hiroaki,Yasutake Kiyoshi

Funder

Osaka University and Kioxia corporation

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference48 articles.

1. Surface microanalytical study on the tribological interface between the sputtered fluoropolymer film and a sliding ball;Sugimoto;J. Appl. Phys.,1989

2. Optical property of fluorocarbon thin films deposited onto polyester film substrate by an r.f. sputtering;Iwamori;Mater. Lett.,2012

3. A novel deposition technique for fluorocarbon films and its applications for bulk- and surface-micromachined devices;Matsumoto;Sens. Actuat. A,1998

4. Plasma-Assisted Etching;Coburn;Plasma Chem. Plasma Process.,1982

5. Angular dependences of SiO2 etch rates in C4F6/O2/Ar and C4F6/CH2F2/O2/Ar plasmas;Cho;J. Vac. Sci. Technol. A,2012

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reactive ion etching process of SiO2 film using on-site synthesized C2F4 from CF4;Japanese Journal of Applied Physics;2021-05-01

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