Diagnosis of radio-frequency silane and silane-nitrogen plasmas based on field ionization mass spectrometry-Reference-Cited by-同舟云学术

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Diagnosis of radio-frequency silane and silane-nitrogen plasmas based on field ionization mass spectrometry

Published:1991-04 Issue:1-3 Volume:246 Page:408-414
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Okuyama F.,Hayashi H.,Iwai H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference12 articles.

1. Optical techniques in plasma diagnostics

2. Mass spectrometry of a silane glow discharge during plasma deposition of a-Si: H films

3. Radical species in argon‐silane discharges

4. Mono‐ and disilicon radicals in silane and silane‐argon dc discharges

5. Principles of Field Ionization and Field Desorption Mass Spectrometry;Beckey,1977

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface and Thin Film Analysis;Nonthermal Plasma Chemistry and Physics;2012-11-13

2. Mass Spectrometry of Free Radicals;Chemical Reviews;2002-08-07

3. Preparation of Thin Cation-Exchange Membranes Using Glow Discharge Plasma Polymerization and Its Reactions;Journal of The Electrochemical Society;2000

4. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes;Plasma Deposition of Amorphous Silicon-Based Materials;1995

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