Chemisorption of isolated Br atoms on Si(100)-(2 × 1) studied by PAC-Reference-Cited by-同舟云学术

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Chemisorption of isolated Br atoms on Si(100)-(2 × 1) studied by PAC

Published:1996-07 Issue:1-3 Volume:360 Page:213-220
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Lohmüller J.,Bertschat H.H.,Granzer H.,Haas H.,Schatz G.,Zeitz W.-D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference30 articles.

1. Surface science aspects of etching reactions

2. Surface-science aspects of plasma-assisted etching

3. Pattern of Si(100): Spontaneous etching withBr2

4. Bromine interaction with Si(100)-2×1: Chemisorption and initial stages of etching

5. Layer-by-layer etching of Si(100)-2×1 withBr2: A scanning-tunneling-microscopy study

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1. Atomic layer etching in HBr/He/Ar/O2 plasmas;Journal of Vacuum Science & Technology A;2024-05-06

2. The Potential of the Perturbed Angular Correlation Technique in Characterizing Semiconductors;Journal of Electronic Materials;2009-01-24

3. Temperature dependence of electric-field gradients at isolated Se adatoms on (001) and (111) surfaces and derived adatom distances;Physical Review B;2001-08-06

4. Magnetic Hyperfine Fields at Se Adatoms on Ni Surfaces;Physical Review Letters;1996-11-11

5. Surface and Interface Magnetism on the Atomic Scale;Frontiers in Magnetic Materials

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