Surface properties of Si(100)2 × 1 upon NH3 adsorption and vacuum annealing
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference29 articles.
1. The preparation, characterization and applications of silicon nitride thin films
2. Amorphous silicon‐silicon nitride thin‐film transistors
3. Dissociative NH3 adsorption on the Si(100)2 × 1 surface at 300 K
4. The adsorption and decomposition of NH3 ON Si(100)—detection of the NH2(a) species
5. The dissociative adsorption of ammonia on Si(100)
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2. Thermal decomposition mechanisms of methylamine, ethylamine, and 1-propylamine on Si(100)-2 × 1 surface;The Journal of Chemical Physics;2011-05-21
3. Cooperative nitrogen insertion processes: Thermal transformation ofNH3on a Si(100) surface;Physical Review B;2007-08-30
4. Oxidation of Nitrided Si(100) by Gaseous Atomic and Molecular Oxygen;The Journal of Physical Chemistry B;2005-04-01
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