Determination of the complex refractive index profiles in P+31 ion implanted silicon by ellipsometry-Reference-Cited by-同舟云学术

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Determination of the complex refractive index profiles in P+31 ion implanted silicon by ellipsometry

Published:1975-04 Issue:2 Volume:49 Page:441-458
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Adams J.R.,Bashara N.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference46 articles.

1. Ion Implantation in Semiconductors;Mayer,1970

2. Ion Beams, with Application to Ion Implantation;Wilson,1973

3. Depth distributions of defects and impurities in 100‐keV B+ ion implanted silicon

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