Nanosecond excimer laser-enhanced chemical etching
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference23 articles.
1. Basic mechanisms in laser etching and deposition
2. Growth of thin films by laser-induced evaporation
3. The interaction of chlorine with copper
4. Chlorine reactions on the Si (111) surface
5. Chemisorption of chlorine on Si(111) 7 × 7 and 1 × 1 surfaces
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. An angle-resolved time-of-flight mass spectrometric study of pulsed laser ablated Ta2O5;Journal of Applied Physics;1998-06
2. Characterization of ultraviolet excited Br[sup ∗]-radical etching of InGaAs/InAlAs material system;Journal of Applied Physics;1996
3. Projection-patterned etching of silicon in chlorine atmosphere with a KrF excimer laser;Applied Physics A Materials Science & Processing;1995-12
4. Excimer laser-assisted etching of silicon in chlorine: adsorption and desorption;Applied Surface Science;1995-02
5. Excimer Laser-assisted Chemical Etching of Copper and Silicon in Chlorine Atmospheres;Laser and Ion Beam Modification of Materials;1994
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