Ion bombardment of X-ray multilayer coatings: Comparison of ion etching and ion assisted deposition-Reference-Cited by-同舟云学术

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Ion bombardment of X-ray multilayer coatings: Comparison of ion etching and ion assisted deposition

Published:1991-04 Issue:3 Volume:47 Page:251-260
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Puik E.J.,van der Wiel M.J.,Zeijlemaker H.,Verhoeven J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference8 articles.

1. Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings

2. On the use of H+ and Ar+ ions for high spatial resolution depth profiling

3. Smoothing of multilayer x‐ray mirrors by ion polishing

4. Enhancement Of The Reflectivity Of Multilayer X-Ray Mirrors By Ion Polishing

5. Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer Coating

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical and structural properties of SiOx films from ion-assisted deposition;Thin Solid Films;2010-06

2. Atomic scale interface engineering by modulated ion-assisted deposition applied to soft x-ray multilayer optics;Applied Optics;2008-08-04

3. Advanced nanometer-size structures;Acta Physica Slovaca. Reviews and Tutorials;2007-12-01

4. The role of energetic ions in the development of multilayered X-ray reflection optics: An overview;Vacuum;2007-08

5. Multilayers for next-generation x-ray sources;SPIE Proceedings;2007-05-04

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