A highly reliable, low cost 0.5 μm three level tungsten metallization-Reference-Cited by-同舟云学术

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A highly reliable, low cost 0.5 μm three level tungsten metallization

Published:1995-10 Issue:1-4 Volume:91 Page:374-377
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Hain M.,Körner H.,Neureither B.,Röhl S.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference2 articles.

1. Advanced Metallization for ULSI Applications;Körner,1994

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