PECVD-AlOx/SiNx passivation stacks on wet chemically oxidized silicon: Constant voltage stress investigations of charge dynamics and interface defect states-Reference-Cited by-同舟云学术

PECVD-AlOx/SiNx passivation stacks on wet chemically oxidized silicon: Constant voltage stress investigations of charge dynamics and interface defect states

Published:2015-04 Issue: Volume:135 Page:49-56
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Töfflinger Jan Amaru,Laades Abdelazize,Korte Lars,Leendertz Caspar,Montañez Liz Margarita,Stürzebecher Uta,Sperlich Hans-Peter,Rech Bernd

Funder

EU project NanoPV

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference46 articles.

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3. Inductively coupled plasma chemical vapour deposited AlOx/SiNy layer stacks for applications in high-efficiency industrial-type silicon solar cells;Dullweber;Sol. Energ. Mater. Sol. Cells,2013

4. Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3;Hoex;Appl. Phys. Lett.,2006

5. Surface passivation of c-Si by atmospheric pressure chemical vapor deposition of Al2O3;Black and McIntosh;Appl. Phys. Lett.,2012

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