Author:
Chen Wenhui,Luo Jun,Meng Lingkuan,Li Junjie,Xiang Jinjuan,Li Junfeng,Wang Wenwu,Chen Dapeng,Ye Tianchun,Zhao Chao
Funder
Youth Innovation Promotion Association of CAS
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference32 articles.
1. EUV lithography;Kemp;C. R. Phys.,2006
2. EUV Lithography for 22nm Half Pitch and Beyond: Exploring Resolution, LWR, and Sensitivity Tradeoffs, Extreme Ultraviolet (Euv) Lithography Ii, 7969;Putna,2011
3. Full wafer scale near zero residual nano-imprinting lithography using UV curable monomer solution;Lee;Microelectron. Eng.,2005
4. Recent progress in direct patterning technologies based on nano-imprint lithography;Byeon;Eur. Phys. J. Appl. Phys.,2012
5. Projection mask-less lithography (PML2): first results from the multi beam blanking demonstrator;Eder-Kapl;Microelectron. Eng.,2006
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献