The etching properties of MgO thin films in Cl2/Ar gas chemistry-Reference-Cited by-同舟云学术

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The etching properties of MgO thin films in Cl2/Ar gas chemistry

Published:2005-03 Issue:1-2 Volume:475 Page:313-317
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Gu Sung-Mo,Kim Dong-Pyo,Kim Kyoung-Tae,Kim Chang-Il

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. PZT Thin Film Preparation on Pt-Ti Electrode by RF Sputtering

2. Properties of ultra-thin lead zirconate titanate thin films prepared by ozone jet reactive evaporation

3. Electrode Dependences of Switching Endurance Properties of Lead-Zirconate-Titanate Thin-Film Capacitors

4. Crystal and Electrical Characterizations of Oriented Yttria-Stabilized Zirconia Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field-Effect Transistor

5. Characterization of $\bf Pb(Zr_{\ninmbi x}Ti_{1-{\ninmbi x}})O_{3}$ Thin Film on Silicon Substrate with Heteroepitaxial Yttria-Stabilized Zirconia (YSZ) Buffer Layer

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dielectric‐Based Metamaterials for Near‐Perfect Light Absorption;Advanced Functional Materials;2024-03-17

2. Electron collision cross section set of Cl2 gas and electron transport analysis in Cl2 gas and Cl2/N2 mixtures;Japanese Journal of Applied Physics;2020-03-06

3. Surface characterization of patterning on MgO single crystals using wet chemical etching process to advance MEMS devices;Journal of Micromechanics and Microengineering;2019-11-07

4. Fabrication, characterization, and fluorine-plasma exposure behavior of dense yttrium oxyfluoride ceramics;Japanese Journal of Applied Physics;2017-05-02

5. Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas;Vacuum;2014-03

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