Plasma enhanced chemical vapor deposition of titanium (IV) ethoxide–oxygen–helium mixtures-Reference-Cited by-同舟云学术

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Plasma enhanced chemical vapor deposition of titanium (IV) ethoxide–oxygen–helium mixtures

Published:2008-06 Issue:15 Volume:516 Page:4940-4945
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Durrant Steven F.,da Cruz Nilson C.,Rangel Elidiane C.,Bica de Moraes Mario A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference40 articles.

1. Colouration of tungsten oxide films: A model for optically active coatings

2. Handbook of Inorganic Materials;Granqvist,1995

3. Electrochromic properties of vanadium pentoxide thin films prepared by new wet process

4. Electrochromism of titanium oxide thin films

5. Electrochromic behaviour of sputtered titanium oxide thin films

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1. Influence of non-thermal TiCl4/Ar + O2 plasma-assisted TiOx based coatings on the surface of polypropylene (PP) films for the tailoring of surface properties and cytocompatibility;Materials Science and Engineering: C;2016-05

2. TiO2 nanoparticles loaded on graphene/carbon composite nanofibers by electrospinning for increased photocatalysis;Carbon;2012-06

3. Effects of nitrogen ion irradiation on plasma polymerized films produced from titanium tetraisopropoxide–oxygen–helium mixtures;Surface and Coatings Technology;2008-12

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