Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering-Reference-Cited by-同舟云学术

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Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering

Published:2005-03 Issue:1-2 Volume:475 Page:298-302
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Park Yong Seob,Myung Hyun Sik,Han Jeon Geon,Hong Byungyou

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4

2. Effect of nitrogen content on the microstructure and mechanical properties of CNx thin films

3. Preparation, microstructural characterisation and tribological behaviour of CN coatings

4. Studies of diamond-like and nitrogen-containing diamond-like carbon using laser Raman spectroscopy

5. Thermal expansion coefficient of amorphous carbon nitride thin films deposited by glow discharge

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1. Effect of V/Mo Atomic Ratio on the Microstructure and Mechanical Properties of MoVCuN Coatings;Materials;2023-12-31

2. Facilitating Complex Thin Film Deposition by Using Magnetron Sputtering: A Review;JOM;2022-04-21

3. Study of the effect of normal load on friction coefficient and wear properties of CNx thin films;AIP Advances;2020-06-01

4. Enhanced Tribological, Electrochemical, and Biocompatibility Properties of Ti6Al4V Alloy Through Gas Nitriding and CN Coating Deposition;Journal of Materials Engineering and Performance;2018-09-24

5. Tribological, electrochemical and biocompatibility properties of Ti6Al4V alloy produced by selective laser melting method and then processed using gas nitriding, CN or Ti-C:H coating treatments;Surface and Coatings Technology;2018-09

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