On the growth, orientation and hardness of chemical vapor deposited Ti(C,N)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference39 articles.
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4. CVD of titanium carbonitride at moderate temperature: Properties and applications;Bonetti;Met. Powder Rep.,1990
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