Funder
National Research Foundation of Korea
MSIT
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges;Gusev;J. Res. Dev.,2006
2. High-performance high-k/metal gates for 45nm CMOS and beyond with gate-first processing;Chudzik,2007
3. Ultrathin (< 4 nm) SiO2 and SiON gate dielectric layers for silicon microelectronics: understanding the processing, structure, and physical and electrical limits;Green;J. Appl. Phys.,2001
4. Structural and interfacial properties of high-k HfOxNy gate dielectric films;He;Mater. Sci. Semicond. Process,2006
5. Electrical properties of HfOxNy thin films deposited by PECVD;Park;Surf. Coat. Technol,2007