Influence of metal plasma ion implantation on photo-sensitivity of anatase TiO2 thin films-Reference-Cited by-同舟云学术

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Influence of metal plasma ion implantation on photo-sensitivity of anatase TiO2 thin films

Published:2006-11 Issue:3 Volume:515 Page:1047-1052
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Wang Da-Yung,Lin Hsiao-Cheng,Yen Chung-Chih

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Photocatalytic and electronic properties of TiO2 powders elaborated by sol–gel route and supercritical drying

2. Applications of titanium oxide photocatalysts and unique second-generation TiO2 photocatalysts able to operate under visible light irradiation for the reduction of environmental toxins on a global scale

3. The influence of transition metal doping on the physical and photocatalytic properties of titania

4. Iron-doped titania semiconductor powders prepared by a sol–gel method. Part I: synthesis and characterization

5. The Role of Metal Ion Dopants in Quantum-Sized TiO2: Correlation between Photoreactivity and Charge Carrier Recombination Dynamics

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