Spectroscopic ellipsometry characterization of high-k gate stacks with Vt shift layers-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Spectroscopic ellipsometry characterization of high-k gate stacks with Vt shift layers

Published:2011-02 Issue:9 Volume:519 Page:2889-2893
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Di Ming,Bersch Eric,Clark Robert,Consiglio Steven,Leusink Gert,Diebold Alain C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors

2. High dielectric constant gate oxides for metal oxide Si transistors

3. High-κ gate dielectrics: Current status and materials properties considerations

4. Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges

5. High-k gate stacks for planar, scaled CMOS integrated circuits

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectroscopic Ellipsometry of Nanoscale Materials for Semiconductor Device Applications;Ellipsometry at the Nanoscale;2013

2. Multi-technique Approach for the Evaluation of the Crystalline Phase of Ultrathin High-k Gate Oxide Films;AIP Conference Proceedings;2011

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3