Growth characteristics and properties of indium oxide and indium-doped zinc oxide by atomic layer deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Growth characteristics and properties of indium oxide and indium-doped zinc oxide by atomic layer deposition

Published:2015-07 Issue: Volume:587 Page:83-87
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kim Donghyun,Nam Taewook,Park Jusang,Gatineau Julien,Kim Hyungjun

Funder

Ministry of Knowledge Economy

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Structural and optical properties of indium oxide thin films prepared by an ultrasonic spray CVD process;Girtan;Surf. Coat. Technol.,2003

2. On the physical properties of In2O3 films prepared by atomic layer deposition using tri-methyl-indium and nitrous oxide;Chi,2010

3. Efficient field emission from single crystalline indium oxide pyramids;Jia;Appl. Phys. Lett.,2003

4. Highly efficient photon-to-electron conversion with mercurochrome-sensitized nanoporous oxide semiconductor solar cells;Hara;Sol. Energy Mater. Sol. Cells,2000

5. Transparent heat-reflecting coatings for solar applications based on highly doped tin oxide and indium oxide;Frank;Sol. Energy Mater.,1983

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma-Enhanced Atomic Layer Deposition Assisted Low-Temperature Synthetic Routes to Rationally Designed Metastable c-Axis Aligned Hexagonal In-Zn-O;Chemistry of Materials;2023-06-26

2. Atomic layer deposition of conductive and semiconductive oxides;Applied Physics Reviews;2022-12

3. Structural, Optical, and Electrical Properties of InO_x Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Flexible Device Applications;ACS Applied Electronic Materials;2022-05-27

4. Synthesis of High Surface Area—Group 13—Metal Oxides via Atomic Layer Deposition on Mesoporous Silica;Nanomaterials;2022-04-25

5. Improved Monolayer MoS Performance With Two-Step Atomic Layer Deposited High- Dielectrics;IEEE Journal of the Electron Devices Society;2022

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3