Deposition-rate dependence of orientation growth and crystallization of Ti thin films prepared by magnetron sputtering-Reference-Cited by-同舟云学术

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Deposition-rate dependence of orientation growth and crystallization of Ti thin films prepared by magnetron sputtering

Published:2015-01 Issue: Volume:574 Page:71-77
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Chen A.Y.,Bu Y.,Tang Y.T.,Wang Y.,Liu F.,Xie X.F.,Gu J.F.

Funder

NSFC

Metal-based Advanced Electrical Materials Key Laboratory of Shanghai Municipal Commission of Education

Shanghai Municipal Education Commission

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Properties of titanium thin films deposited by dc magnetron sputtering;Jeyachandran;Mater. Sci. Eng. A,2006

2. Ellipsometric studies of N+ implanted Ti thin films;Sundari;Thin Solid Films,2010

3. Oxidation of thin Ti films and its simultaneous hydrogenation by water vapor plasma;Pranevicius;Thin Solid Films,2012

4. Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering;Zhang;Surf. Coat. Technol.,2009

5. Effect of thickness and substrate temperature on the properties of transparent Ti-doped In2O3 films grown by direct current magnetron sputtering;Kim;Thin Solid Films,2013

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1. Study on Process Parameters of Magnetron Sputtering Titanium Coating in Deep Porous Structures;ACS Omega;2024-03-13

2. Ultra-strength of Ti films via (002) texture optimization and nanocolumnar strengthening;Materials Science and Engineering: A;2024-03

3. Modification mechanism of Ti-6Al-4V alloy with pre-coated Ti-Cu-Al multilayer film treated by ion nitriding: Experiments and first-principles calculations;Surfaces and Interfaces;2023-08

4. Growth of hard metal films by deep oscillation magnetron sputtering;Surface Engineering;2023-05-04

5. Evolution of the Shadow Effect with Film Thickness and Substrate Conductivity on a Hemispherical Workpiece during Magnetron Sputtering;Metals;2023-01-13

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