Author:
Park S.D.,Lee Y.J.,Cho N.G.,Kim S.G.,Choe H.H.,Hong M.P.,Yeom G.Y.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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1. Tungsten metal gate etching in Cl2∕O2 inductively coupled high density plasmas;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11