Thermopiles fabricated using silicon planar technology-Reference-Cited by-同舟云学术

Thermopiles fabricated using silicon planar technology

Published:1982-01 Issue: Volume:3 Page:179-183
ISSN:0250-6874
Container-title:Sensors and Actuators
language:en
Short-container-title:Sensors and Actuators

Author:

Nieveld G.D.

Publisher

Elsevier BV

Subject

General Engineering

Reference5 articles.

1. A monolithic thermopile detector fabricated using integrated-circuit technology;Lahiji;Proc. IEDM, Washington, D.C., USA,1980

2. A batch-fabricated silicon thermopile infrared detector;Lahiji;IEEE Trans. Electron Devices, ED-29,1982

3. On the irreversible thermodynamic analysis of thermoelectric devices;Arnas;Proc. Second Intern. Conf. on Thermoelectric Energy Conversion, Arlington, Texas, USA,1978

4. Seebeck effect in silicon;Geballe;Phys. Rev.,1955

5. An integrated electrothermal amplitude detector using the Seebeck effect;Kerkhoff;Proc. ESSCIRC, Southampton, Gr. Britain,1979

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