Insights into the atomistic behavior in diamond chemical mechanical polishing with OH environment using ReaxFF molecular dynamics simulation-Reference-Cited by-同舟云学术

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Insights into the atomistic behavior in diamond chemical mechanical polishing with OH environment using ReaxFF molecular dynamics simulation

Published:2019-08 Issue: Volume:166 Page:136-142
ISSN:0927-0256
Container-title:Computational Materials Science
language:en
Short-container-title:Computational Materials Science

Author:

Shi Zhuoying,Jin Zhuji,Guo Xiaoguang,Yuan Song,Guo Jiang

Funder

NSFC

the National Basic Research Program of China

Publisher

Elsevier BV

Subject

Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science

Reference49 articles.

1. Surface conversion reaction and high efficient grinding of CVD diamond films by chemically mechanical polishing;Xu;Ceram. Int.,2018

2. Signal analysis of surface roughness in diamond turning of lens molds;Hocheng;Int. J. Mach. Tools Manuf.,2004

3. Optical effects of surface finish by ultraprecision single point diamond machining;Li;J. Manuf. Sci. Eng.,2010

4. Thermal and structural deformations during diamond turning of rotationally;Rakuff;J. Manuf. Sci. Eng.,2008

5. Surface damage of single-crystal diamond (100) processed based on a sol-gel polishing tool;Lin;Diam. Relat. Mater.,2018

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