Electron Number Density Measurements in Ar and Ar-N2 Inductively Coupled Plasmas

Author:

Montaser Akbar1,Fassel Velmer A.1

Affiliation:

1. Ames Laboratory and Department of Chemistry, Iowa State University, Ames, Iowa 50011

Abstract

The emission spectrum of the series limit of Al was used to estimate the electron number densities ( n e) in inductively coupled Ar or Ar-N2 plasmas (ICP). The spectra of the series limit were recorded either with a silicon-intensified target vidicon detector or by a computer-controlled, scanning spectrometer. Background stripping was performed on the spectra recorded by both instruments to enhance signal recovery. Under comparable experimental conditions, the n e values in the Ar-supported ICP were higher than those observed in Ar-N2 plasma, when pure N2 was used in the outer flow. However, the n e value of the Ar ICP under the conditions commonly used in analytical laboratories (15 mm observation height and 1200 W forward power) was comparable to that found in pure N2 outer flow, Ar-N2 plasmas operated under conditions (5 mm observation height and 3000 W forward power) suitable for exciting spectral lines of high excitation energies. Whereas the use of higher, carrier gas flows tended to reduce the n e values of the Ar ICP substantially, this trend was not observed for the pure N2 outer flow Ar-N2 plasma.

Publisher

SAGE Publications

Subject

Spectroscopy,Instrumentation

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3