Micro-Raman scattering study of hexagonal InGaN epitaxial layer

Author:

Wang Rui-Min ,Chen Guang-De ,Zhu You-Zhang ,

Abstract

Hexagonal InxGa1-xN film grown by metalorganic chemical vapor deposition (MOCVD) was studied by Micro-Raman scattering and X-ray diffraction. The phase separation was observed in InxGa1-xN, the biaxial stress was measured by both Raman and X-ray diffraction. In Raman spectroscopy, the A1(LO) mode of InxGa1-xN is absent. Instead, the LO phonon-plasmon coupled mode (LPP+) was observed at about 778 cm-1. The carrier concentration was determined by the frequency of the coupled mode. The E2 and A1(TO)modes of InxGa1-xN layer exhibit a down-shift compare to those of GaN layer. At low temperature, the peak induced by electronic transition was observed in Raman spectra of InxGa1-xN.

Publisher

Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences

Subject

General Physics and Astronomy

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Raman spectra of semi-polar (11-22) InGaN thick films;Vibrational Spectroscopy;2022-03

2. The properties of GaMnN films grown by metalorganic chemical vapour deposition using Raman spectroscopy;Chinese Physics B;2012-07

3. Ultraviolet resonant Raman scattering in InGaN films;Acta Physica Sinica;2009

4. LO Phonon-Plasmon Coupled Mode in Hexagonal InGaN Alloy;SPECTROSC SPECT ANAL;2009

5. Yellow and red luminescence in Mg-implanted GaN epitaxial films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2007-11

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