Quantum Electronic Stability of Atomically Uniform Films-Reference-Cited by-同舟云学术

Quantum Electronic Stability of Atomically Uniform Films

Published:2001-05-11 Issue:5519 Volume:292 Page:1131-1133
ISSN:0036-8075
Container-title:Science
language:en
Short-container-title:Science

Author:

Luh D.-A.¹²,Miller T.¹²,Paggel J. J.³,Chou M. Y.⁴,Chiang T.-C.¹²

Affiliation:

1. Department of Physics, University of Illinois at Urbana–Champaign, 1110 West Green Street, Urbana, IL 61801–3080, USA.

2. Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana–Champaign, 104 South Goodwin Avenue, Urbana, IL 61801–2902, USA.

3. Freie Universität Berlin, Institut für Experimentalphysik, 14195 Berlin, Germany.

4. School of Physics, Georgia Institute of Technology, Atlanta, GA 30332–0430, USA.

Abstract

We have studied the structural stability of thin silver films with thicknesses of N = 1 to 15 monolayers, deposited on an Fe(100) substrate. Photoemission spectroscopy results show that films of N = 1, 2, and 5 monolayer thicknesses are structurally stable for temperatures above 800 kelvin, whereas films of other thicknesses are unstable and bifurcate into a film with N ± 1 monolayer thicknesses at temperatures around 400 kelvin. The results are in agreement with theoretical predictions that consider the electronic energy of the quantum well associated with a particular film thickness as a significant contribution to the film stability.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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