High-resolution line and space pattern fabrication by electron beam lithography using NEB-22 resist
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/54/i=11/a=118004/pdf
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1. Variable spot shaping for electron‐beam lithography
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3. Newly developed electron beam stepper for nanoimprint mold fabrication
4. Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520
5. 0.15 µmElectron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication
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