Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas-Reference-Cited by-同舟云学术

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Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas

Published:2013-12-30 Issue:1 Volume:53 Page:010201
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Shiratani Masaharu,Koga Kazunori,Kamataki Kunihiro,Iwashita Shinya,Uchida Giichiro,Seo Hyunwoong,Itagaki Naho

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference40 articles.

1. RF Sputter-Etching by Fluoro-Chloro-Hydrocarbon Gases

2. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

3. Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence

4. Gold Nanoparticles: Assembly, Supramolecular Chemistry, Quantum-Size-Related Properties, and Applications toward Biology, Catalysis, and Nanotechnology

5. Room-temperature transistor based on a single carbon nanotube

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3. Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma;Plasma and Fusion Research;2019-09-09

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5. Investigation of non linear dynamics of an excitable magnetron sputtering plasma;Results in Physics;2019-03

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