Stacking Faults from Oxide Precipitates in CZ Silicon
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/18/i=S1/a=179/pdf
Cited by 24 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Properties of silicon crystals;Handbook of Silicon Based MEMS Materials and Technologies;2020
2. A criterion for the formation of stacking faults at incoherent spheroidal precipitates and application to silicon oxide in silicon;physica status solidi (a);2006-08
3. Determination of the criteria for nucleation of ring-OSF from small as-grown oxygen precipitates in CZSi crystals;Materials Science and Engineering: B;1996-01
4. Determination of the criteria for nucleation of ring-OSF from small as-grown oxygen precipitates in CZ-Si crystals;C,H,N and O in Si and Characterization and Simulation of Materials and Processes;1996
5. Stresses and silicon interstitials during the oxidation of a silicon substrate;Philosophical Magazine B;1987-01
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