Plasma vapor deposited n-indium tin oxide/p-copper indium oxide heterojunctions for optoelectronic device applications-Reference-Cited by-同舟云学术

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Plasma vapor deposited n-indium tin oxide/p-copper indium oxide heterojunctions for optoelectronic device applications

Published:2017-11-08 Issue:12 Volume:56 Page:125502
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Jaya T. P.,Pradyumnan P. P.

Funder

Kerala State Council for Science, Technology and Environment

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/56/i=12/a=125502/pdf

Reference29 articles.

1. Photo-Assisted VOC Detection by Transparent pn Junction

2. High mobility transparent conducting oxides for thin film solar cells

3. Handbook of Transparent Conductors

4. Preparation of copper oxide thin film by the sol–gel-like dip technique and study of their structural and optical properties

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1. Spectroscopic study of the effect of annealing temperature and atmosphere on the opto-electrical properties of sputtered ITO thin films;Bulletin of Materials Science;2023-04-11

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