Control of Resin Filling and Pattern Quality of Ultraviolet Nanoimprint Lithography in Pentafluoropropane and Helium Ambient
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference32 articles.
1. Mold-assisted nanolithography: A process for reliable pattern replication
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1. Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum;Journal of Vacuum Science & Technology B;2021-05
2. Mold Design and Process for Application of Nanoimprint Lithography to Interconnections;Journal of The Japan Institute of Electronics Packaging;2019-03-01
3. Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere;Journal of Photopolymer Science and Technology;2018-06-25
4. Condition Determination of Ultraviolet Light Exposure for High-throughput Nanoimprinting;Chemistry Letters;2016-12-05
5. Bubble-free patterning with low line edge roughness by ultraviolet nanoimprinting using trans-1,3,3,3-tetrafluoropropene condensable gas;Applied Physics Letters;2016-10-03
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