Growth mechanism of zinc oxide thin film by mist chemical vapor deposition via the modulation of [H2O]/[Zn] ratios
Author:
Funder
Japan Society for the Promotion of Science
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://iopscience.iop.org/article/10.7567/1882-0786/ab2134/pdf
Reference30 articles.
1. Effects of oxygen pressure on the growth of pulsed laser deposited ZnO films on Si(001)
2. Control of CVD-deposited ZnO films properties through water/DEZ ratio: Decoupling of electrode morphology and electrical characteristics
3. Growth Model of MOCVD Polycrystalline ZnO
4. Increasing Polycrystalline Zinc Oxide Grain Size by Control of Film Preferential Orientation
5. Texture development of non-epitaxial polycrystalline ZnO films
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2. Growth mechanism under the supply-limited regime in mist chemical vapor deposition: presumption of mist droplet state in high-temperature field;Japanese Journal of Applied Physics;2023-12-27
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