Structural and electrical properties and current–voltage characteristics of nitrogen-doped diamond-like carbon films on Si substrates by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Structural and electrical properties and current–voltage characteristics of nitrogen-doped diamond-like carbon films on Si substrates by plasma-enhanced chemical vapor deposition

Published:2016-05-20 Issue:6 Volume:55 Page:065502
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Tsuchiya Masato,Murakami Kazuki,Magara Kohei,Nakamura Kazuki,Ohashi Haruka,Tokuda Kengo,Takami Takahiro,Ogasawara Haruka,Enta Yoshiharu,Suzuki Yushi,Ando Satoshi,Nakazawa Hideki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=6/a=065502/pdf

Reference36 articles.

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4. Deposition of mechanically hard amorphous carbon nitride films from decomposition of BrCN. Effects of substrate cooling and pulsed rf-bias voltage

5. Friction, wear and N2-lubrication of carbon nitride coatings: a review

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