Mesa‐type quantum cascade lasers fabricated by using inductively coupled plasma reactive ion etching-Reference-Cited by-同舟云学术

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Mesa‐type quantum cascade lasers fabricated by using inductively coupled plasma reactive ion etching

Published:2019-05 Issue:11 Volume:55 Page:660-661
ISSN:0013-5194
Container-title:Electronics Letters
language:en
Short-container-title:Electron. lett.

Author:

Seok B.T.¹,Kim S.Y.¹,Jun D.H.²,Jang J.H.¹

Affiliation:

1. School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Techology1 Oryoung‐dongBuk‐guGwangju500Republic of Korea

2. Korea Advanced Nano Fab Center109. Gwanggyo‐ro, Yeongtong‐gu, Suwon‐siGyeonggi‐do16229Republic of Korea

Funder

Ministry of Trade, Industry and Energy

Publisher

Institution of Engineering and Technology (IET)

Subject

Electrical and Electronic Engineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/el.2018.7571

Reference11 articles.

1. Quantum cascade laser;Faist J.;Science,1994

2. 1.6W high wall plug efficiency, continuous-wave room temperature quantum cascade laser emitting at 4.6μm

3. 3 W continuous-wave room temperature single-facet emission from quantum cascade lasers based on nonresonant extraction design approach

4. Quantum cascade lasers grown by metalorganic vapor phase epitaxy

5. High‐performance quantum cascade lasers grown by metal‐organic vapor phase epitaxy and their applications to trace gas sensing;Troccoli M.;J. Light. Technol.,2008

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simulation of Low-Pressure Inductively Coupled Plasma with Displacement Potential and Gas Flow;Физика плазмы;2024-08-04

2. Simulation of Low-Pressure Inductively Coupled Plasma with Displacement Potential and Gas Flow;Plasma Physics Reports;2024-01

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