Tribological Behavior of Few-Nanometer-Thick Mos2 Prepared by Low-Temperature Conversion of Atomic Layer Deposited Moox Films-Reference-Cited by-同舟云学术

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Tribological Behavior of Few-Nanometer-Thick Mos2 Prepared by Low-Temperature Conversion of Atomic Layer Deposited Moox Films

Published:2023 Issue: Volume: Page:
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Author:

Babuska Tomas,Dugger Michael T.,Walczak Karl A.,Lu Ping,Schwartzberg Adam,Aloni Shaul,Kuykendall Tevye R.,Curry John F.

Publisher

Elsevier BV

Reference48 articles.

1. Low-temperature plasma-assisted growth of large-area MoS 2 for transparent phototransistors;A Bala;Adv. Funct. Mater,2022

2. Low-temperature synthesis of large-scale molybdenum disulfide thin films directly on a plastic substrate using plasma-enhanced chemical vapor deposition;C Ahn;Adv. Mater,2015

3. Growth of Multiorientated Polycrystalline MoS2 Using Plasma-Enhanced Chemical Vapor Deposition for Efficient Hydrogen Evolution Reactions;N Liu;Nanomaterials (Basel),2020

4. Applications of solid lubricant films in spacecraft;M R Hilton;Surf. Coat. Technol,1992

5. Super-low friction of MoS2 coatings in various environments;C Donnet;Tribology International,1996

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