Effect of Target Power Ratio on Microstructure and Deposition Rate of Tin Film Deposited by Dual Pulse Power Magnetron Sputtering
Author:
Publisher
Elsevier BV
Subject
General Earth and Planetary Sciences,General Environmental Science
Reference21 articles.
1. Preparation and performance of nanometric Ti/TiN multi-layer physical vapor deposited coating on 316L stainless steel as bipolar plate for proton exchange membrane fuel cells;S Jannat;J. Power Sources,2019
2. Comparison of TiN and CN coatings on orthodontic stainless steel: Tribological and biological evaluation;M Zhang;Surf. Coat. Tech,2019
3. The properties of TiN thin films deposited by pulsed direct current magnetron sputtering;T S Yeh;Thin Solid Films,2008
4. Effects of magnetic field strength and deposition pressure on the properties of TiN films produced by high power pulsed magnetron sputtering (HPPMS);J Wu;Surf. Coat. Tech,2017
5. Structure, mechanical and corrosion properties of TiN films deposited on stainless steel substrates with different inclination angles by DCMS and HPPMS;F Jiang;Surf. Coat. Tech,2016
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