Studies on High Quality Gan/Aln Deposited on Glass Substrates by Radio-Frequency Reactive Sputtering

Author:

Liu Wei-Sheng,Wu Sui-Hua,GURURAJAN BALAJI,Huang Li-Cheng,Chi Chung-Kai,Hu Kuo-Jui,Kuo Hsing-Chun

Publisher

Elsevier BV

Reference48 articles.

1. GaN thin film: growth and characterizations by magnetron sputtering;C M Furqan;Surfaces and Interfaces,2021

2. Field emission from amorphous GaN deposited on Si by dc sputtering;F Ye;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,2006

3. New applications advisable for gallium nitride;S Pearton;Materials today,2002

4. Non-polar GaN thin films deposition on glass substrate at low temperatures by conventional RF sputtering;M Simanullang;Thin Solid Films,2019

5. GaN films prepared by middlefrequency magnetron sputtering;M Li;Journal of the Korean Physical Society,2008

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