Phenol Sulfonic Acid Oxidation in aqueous solution by UV, UV/H2O2 and Photo-Fenton Processes-Reference-Cited by-同舟云学术

Phenol Sulfonic Acid Oxidation in aqueous solution by UV, UV/H2O2 and Photo-Fenton Processes

Published:2021-03-26 Issue: Volume:8 Page:6-10
ISSN:2313-0555
Container-title:International Journal of Materials
language:en
Short-container-title:

Author:

Jamshidi N.¹,Jafarzadeh M.T.²,Khoshgard A.³,Talebiazar L.⁴,Aslaniavali R.⁵

Affiliation:

1. HSE Training Manager, National Petrochemical Company, Tehran, I.R. Iran.

2. Manager of Environment, National Petrochemical Company, Tehran, I.R. Iran.

3. Chemical Engineernig Dep. Islamic, Azad University South Tehran Branch, Tehran, Iran

4. Senior Expert of Environment Lab., AmirKabir University of Technology, Tehran, I.R. Iran

5. Senior Expert of Environment, AFA Company, Tehran, I.R.Iran

Abstract

In this study, advanced oxidation processes (UV, UV/H2O2, UV/H2O2/Fe(II) and UV/H2O2/Fe(III)) were investigated in lab-scale experiments for degradation of phenol sulfonic acid (PSA) in aqueous solution. The study showed that the UV/H2O2 process has removal percentage 90.9, 93.0 and 94.4 for neutral, basic and acidic conditions in 20 minutes respectively. The experimental results showed that the optimum conditions were obtained at a pH value of 3, with 4 mmol/1 H2O2, and 0.25 mmol/1 Fe(II) for the UV/H2O2/Fe(II) system and 6 mmol/l H2O2 and, 0.4 mmol/1 Fe(III) for the UV/H2O2/Fe(III) system. The reaction was influenced by the pH, the input concentration of H2O2 and the amount of the iron catalyst and the type of iron salt. As for the UV processes, UV/H2O2 showed the highest degradation rate under acidic conditions

Publisher

North Atlantic University Union (NAUN)

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