Use of multiple photoexcitation in an optically thick silicon-aluminium plasma to obtain lasing at 44 AA-Reference-Cited by-同舟云学术

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Use of multiple photoexcitation in an optically thick silicon-aluminium plasma to obtain lasing at 44 AA

Published:1978-10-28 Issue:20 Volume:11 Page:L643-L649
ISSN:0022-3700
Container-title:Journal of Physics B: Atomic and Molecular Physics
language:
Short-container-title:J. Phys. B: At. Mol. Phys.

Author:

Apruzese J P,Davis J,Whitney K G

Publisher

IOP Publishing

Subject

Atomic and Molecular Physics, and Optics

Link

http://stacks.iop.org/0022-3700/11/i=20/a=009/pdf

Reference8 articles.

1. Some effects of radiative and collisional broadening on line emission in a spherical, laser-heated plasma

2. Atomic parameters and rate coefficients for selected transitions in A1(XII)

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical and experimental study of uv lasers in Be-like ions pumped by resonant photoexcitation;Physical Review A;1989-05-01

2. Observed enhanced fluorescence at 2177, 2163, 1923, and 1620 Å in C III by photoexcitation with Mn VI line radiation at 310 Å;Applied Physics Letters;1985-03

3. The quasar 0805+046 as a helium-rich shell star;Astrophysics and Space Science;1985

4. X‐ray lasing in a Na/Ne plasma environment;Journal of Applied Physics;1985-01

5. Population inversions for amplification of spontaneous emission in the soft X-ray range. A step towards X-ray laser;Annales de Physique;1984

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