Reduction of surface roughness and aperture size effect for etching of Si with XeF2
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. The etching of silicon with XeF2vapor
2. Comparison of XeF2 and F‐atom reactions with Si and SiO2
3. Controlled pulse-etching with xenon difluoride
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