Abstract
Abstract
The characteristics of an AlGaN/GaN high-electron-mobility transistor buffer structure are studied and optimized by employing an AlN/GaN superlattice (SL) structure. Through vertical leakage analysis and back-gate measurement, combined with Silvaco-TCAD simulation, the influence of buffer trapson the carrier transport behaviors and electrical performance for SL buffer structures under a high electric field is analyzed. The AlN/GaN SL buffer structures are further optimized with various AlN/GaN thickness ratios and their total thickness through both simulation and experimental studies. As a result, a high breakdown voltage of up to 1.3 kV with a maximum breakdown electric field of 2.8 MV cm−1 has been achieved. Moreover, the buffer trapping effect is dramatically suppressed, leading to a minimum drop of channel current for the optimized sample, in which donor traps are found to play a positive role in the device dynamic characteristics.
Funder
the Key Research Program of Frontier Sciences, CAS
Scientific and Technological Research Council of Turkey (TUBITAK) under 2568 Chinese Academy of Sciences (CAS) Bilateral Cooperation Program
Strategic Priority Research Program of CAS
Guangdong Province Key-Area Research and Development Program
Natural Science Foundation of Jiangsu Province
the Bureau of International Cooperation, CAS
Suzhou Science and Technology Program
Jiangxi Double Thousand Plan
Guangdong Basic and Applied Basic Research Foundation
Program of Jiangsu Province
Natural Science Foundation of China
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
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