Enhanced breakdown voltage and dynamic performance of GaN HEMTs with AlN/GaN superlattice buffer

Author:

Chen XinORCID,Zhong Yaozong,Yan ShumengORCID,Guo Xiaolu,Gao Hongwei,Sun Xiujian,Wang Haodong,Li FangqingORCID,Zhou Yu,Feng MeixinORCID,Yilmaz Ercan,Sun Qian,Yang Hui

Abstract

Abstract The characteristics of an AlGaN/GaN high-electron-mobility transistor buffer structure are studied and optimized by employing an AlN/GaN superlattice (SL) structure. Through vertical leakage analysis and back-gate measurement, combined with Silvaco-TCAD simulation, the influence of buffer trapson the carrier transport behaviors and electrical performance for SL buffer structures under a high electric field is analyzed. The AlN/GaN SL buffer structures are further optimized with various AlN/GaN thickness ratios and their total thickness through both simulation and experimental studies. As a result, a high breakdown voltage of up to 1.3 kV with a maximum breakdown electric field of 2.8 MV cm−1 has been achieved. Moreover, the buffer trapping effect is dramatically suppressed, leading to a minimum drop of channel current for the optimized sample, in which donor traps are found to play a positive role in the device dynamic characteristics.

Funder

the Key Research Program of Frontier Sciences, CAS

Scientific and Technological Research Council of Turkey (TUBITAK) under 2568 Chinese Academy of Sciences (CAS) Bilateral Cooperation Program

Strategic Priority Research Program of CAS

Guangdong Province Key-Area Research and Development Program

Natural Science Foundation of Jiangsu Province

the Bureau of International Cooperation, CAS

Suzhou Science and Technology Program

Jiangxi Double Thousand Plan

Guangdong Basic and Applied Basic Research Foundation

Program of Jiangsu Province

Natural Science Foundation of China

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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