Two-dimensional fluid simulation of inductively coupled N2/NH3/SiH4 discharge
Author:
Funder
Korea Institute for Advancement of Technology grant funded by Korea Govermen
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1088/1361-6463/ac2b62/pdf
Reference55 articles.
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3. Comprehensive simulation of the effects of process conditions on plasma enhanced chemical vapor deposition of silicon nitride;Bavafa;Semicond. Sci. Technol.,2008
4. Various applications of silicon nitride by catalytic chemical vapor deposition for coating, passivation and insulating films;Masuda;Thin Solid Films,2006
5. Application of plasma enhanced chemical vapor deposition silicon nitride as a double layer antireflection coating and passivation layer for polysilicon solar cells;Winderbaum;J. Vac. Sci. Technol. A,1997
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