A mixture of Si3N4 powder and SiO2 sand as a novel DC arc quenching medium for improvement of the current-limiting performance of a model electric fuse

Author:

Kodama NaotoORCID,Yokomizu YasunobuORCID,Takenaka WakuORCID

Abstract

Abstract A current-limiting and consequent direct current (DC) arc interruption requires an increase in arc resistance r a r c for a DC fuse. Flattery silica (SiO2) sand has been used as an arc quenching medium in fuses for decades. However, there are few reports about a novel arc quenching medium which enables more r a r c increases compared to flattery SiO2 sand. This paper uniquely selected a novel arc quenching medium based on the following material properties: (1) electrical resistivity and thermal conductivity in the solid phase, (2) the possibility of r a r c increasing in the gas phase, (3) the possibility of electrical insulation after re-solidification, and (4) the cost of materials. As a result, we originally selected a powder mixture of silicon-nitride (Si3N4) and flattery SiO2 sand as a promising novel arc quenching medium. Therefore, DC interruption experiments were performed using a Si3N4/flattery SiO2 sand powder mixture under different Si3N4 concentration conditions. As a result of 1000 A DC arc quenching experiments, the utilization of Si3N4 powder with the flattery SiO2 sand successfully increased the arc resistance r a r c during the arc quenching process. The increasing Si3N4 concentration exhibited a further increase in r a r c during the arc quenching process. As a result of the r a r c increase, the arc quenching time was significantly shortened to 30 ms for 30 wt.% Si3N4 conditions from 54 ms for the SiO2 sand conditions. In addition, utilization of Si3N4 powder achieved high insulation resistance over few MΩ after DC arc interruption. The above results clearly indicate that utilization of Si3N4 powder with flattery SiO2 sand can increase the DC interruption performance of the fuse.

Funder

New Energy and Industrial Technology Development Organization

Publisher

IOP Publishing

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