Photolithographically-patterned C-MEMS graphene by carbon diffusion through nickel

Abstract

Abstract In recent years the most studied carbon allotrope has been graphene, due to the outstanding properties that this two-dimensional material exhibits; however, it turns out to be a difficult material to produce, pattern, and transfer to a device substrate without contamination. Carbon microelectromechanical systems are a versatile technology used to create nano/micro carbon devices by pyrolyzing a patterned photoresist, making them highly attractive for industrial applications. Furthermore, recent works have reported that pyrolytic carbon material can be graphitized by the diffusion of carbon atoms through a transition metal layer. In this work we take advantage of the latter two methods in order to produce multilayer graphene by improving the molecular ordering of photolithographically-defined pyrolytic carbon microstructures, through the diffusion (annealing) of carbon atoms through nickel, and also to eliminate any further transfer process to a device substrate. The allotropic nature of the final carbon microstructures was inspected by Raman spectroscopy (Average I D/I G of 0.2348 ± 0.0314) and TEM clearly shows well-aligned lattice planes of 3.34 Å fringe separation. These results were compared to measurements made on pyrolytic carbon (Average I D/I G of 0.9848 ± 0.0235) to confirm that our method is capable of producing a patterned multilayer graphene material directly on a silicon substrate.