Synthesis of nanostructure Ta2O5 coatings using plasma reactive sputtering technique for optical filter application

Abstract

Abstract Titanium bentoxide Ta2O5 deposited on glass substrates by were heated to 400 °C for 1, 2 and 6 hours. The as-deposited Ta2O5 films deposited by DC reactive sputtering show amorphous structure, the structure improved to crystalline after increasing annealing temperature. When the annealing time rises to 6 hours, Ta2O5 films with β-phase structure was obtained. The basic and optical properties of arranged films have been considered utilizing XRD and UV-Visible spectroscopy. The XRD comes about appeared that all films are polycrystalline in nature with orthorhombic structure and favored introduction along (0140) plane. The crystallite size was calculated using Scherrer formula and it is found that the 2 hrs sputtering time, 3Kv, 10Amp and 4×10-2mbar. Maximum crystallite size was (27.5nm). The absorbance and transmittance spectra have been recorded in the wavelength extend of (300-1000) nm in arrange to think about the optical properties. The optical energy gap for permitted direct electronic move was calculated using Tauc condition with regard to vitality of photon. It is found that the band gap increases with increasing annealing times and its ranges between 3.2 eV and 3.75 eV for the prepared Ta2O5 thin films.