Author:
Serdobintsev A A,Luzanov V A,Kozhevnikov I O,Ryabukho P V,Mitin D M,Bratashov D N,Starodubov A V,Pavlov A M
Abstract
Abstract
A novel method for thin silicon films crystallization that combines advantages of laser- and metal-induced crystallization technologies is reported. Polycrystalline silicon films were synthesized on flexible polyimide substrates following the proposed approach. Films obtained possess high crystal structure regularity and crystallinity.
Subject
General Physics and Astronomy
Cited by
1 articles.
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