Generation of plasma from multiple targets by laser ion source for TIARA ion implanter

Abstract

Abstract We investigated a laser ion source for use as an ion source for the ion implanter in Takasaki Ion Accelerators for Advanced Radiation Application to increase the number of ion species that can be produced and to enable rapid switching of ion species. Herein, we analyzed the charge state distribution of ions in a laser plasma generated through irradiation of graphite, titanium, copper, and tantalum targets with 30 mJ Nd:YAG laser to determine the particle number of low-charge ions per pulse at 1.1 m from the target. The particle number of singly charged ions could be increased by adjusting the laser power density. For carbon, titanium, and tantalum, the particle numbers were in the order of 1010 ions per pulse, whereas for copper, the particle numbers were in the order of 109, lower than for other target materials.