Studying of DC Electrical Properties for Gold Sputtered PM-355 Thin Films after Annealing and Ion Beam Irradiation

Abstract

Abstract This article investigated the dc electrical properties of Au / PM-355 thin films synthesized using magnetron sputtering. PM-355 specimens were cleaned by ethanol and then were deposited by gold of different thicknesses equal to 300, 400, 500, 700, 1000, 1300, and 1500 nm. From dc electrical measurements as resistance, resistivity and conductivity were investigated for these thin films due to determine the optimum Au thickness with good characteristic. Then, this optimum thickness was treated by annealing in air up to 140 °C for 30 minutes. Hence, another organic cleaner, chloroform, was used before the deposition of optimum thickness forming thin film. Also, study the effect of nitrogen ion beam extracted from conical anode-disc cathode ion source carried out for 30 minutes with operating conditions on the organic cleaners and annealing Au / PM-355 thin films. Moreover, Shore D hardness tester was used to measure micro-hardness for all thin films compared by blank PM-355. Then, the comparison was done between the thin films through dc electrical conductivity and micro-hardness data at the absence and presence of ion beam irradiation. Finally, the change in surface morphology of thin films due to different treatments can be observed by scanning electron microscope.